Precision Fabrication Techniques for Microphotonic Devices

Microphotonic devices seek to miniaturize and integrate the components needed for optical networking. These devices have exacting fabrication tolerances for feature size, patternplacement, and surface roughness. Careful control of feature size is critical for resonant structures and phase-matching between coupled waveguides, while pattern-placement is essential for devices that rely on long-range interference effects. Surface roughness often dominates optical loss in a device. As a result, only careful control of the fabrication process can maximize device performance. This project focuses on Bragg-grating-based devices and highindex-contrast devices; both of which require precision fabrication.